DESCRIPTION: Sulphur Hexafluoride is a non-flammable, colourless, odourless gas.

TYPICAL APPLICATIONS: Sulfur Hexafluoride is used for plasma etching prior to chemical vapor deposition (CVD). Processes include oxide etching, nitride etching and wafer cleaning. Sulfur Hexafluoride gas, which is itself inert, disassociates in the presence of an RF field to form reactive fluoride ions. The resulting highly reactive ions are excellent for etching tungsten and tungsten silicide films.